| 000 | 00641nam a2200217 4500 | ||
|---|---|---|---|
| 001 | 11083 | ||
| 003 | BD-DhUET | ||
| 008 | 850207s1985 nyua b 001 0 eng | ||
| 020 | _a0471869600 | ||
| 040 |
_aDLC _cDLC _dBD-DhUET |
||
| 082 | 0 | 0 |
_a623.8173 _bSUG/1978 |
| 100 | _aSugano, Takuo | ||
| 245 | 0 | 0 |
_aApplications of plasma processes to VLSI technology _cedited by Takuo Sugano ; translated by Hyo-gun Kim |
| 260 |
_aNew York _bJohn Wiley & Sons _c1978 |
||
| 300 |
_axiv, 394 p. _bill. _c24 cm. |
||
| 504 | _aIncludes bibliographies | ||
| 650 | 0 | _aSemiconductors | |
| 650 | 0 | _aIntegrated circuits | |
| 700 | _aKim, Hyo-Gun | ||
| 942 | _cEB | ||
| 999 |
_c11083 _d11083 |
||