| 000 | 00879nam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | 2634 | ||
| 003 | BD-DhUET | ||
| 008 | 890809s1990 njua b 001 0 eng | ||
| 020 | _a0815512201 : | ||
| 040 |
_aDLC _cDLC _dBD-DhUET |
||
| 082 | 0 | 0 |
_a621.04402 _bROS/1990 |
| 245 | 0 | 0 |
_aHandbook of plasma processing technology : _bfundamentals, etching, deposition, and surface interactions / _cedited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. |
| 250 | _aIst ed. | ||
| 260 |
_aPark Ridge, N.J., U.S.A. : _bNoyes Publications, _c1990. |
||
| 300 |
_axxiii, 523 p. : _bill. ; _c25 cm |
||
| 504 | _aIncludes bibliographies. | ||
| 650 | 0 | _aPlasma engineering - Handbooks, manuals etc. | |
| 700 | 1 | _aRossnagel, Stephen M. | |
| 700 | 1 | _aCuomo, J. J. | |
| 700 | 1 | _aWestwood, William D. | |
| 942 | _cEB | ||
| 856 | 4 | 2 | _uhttp://www.loc.gov/catdir/description/wap041/89022834.html |
| 999 |
_c2634 _d2634 |
||