| 000 | 00569nam a2200217 a 4500 | ||
|---|---|---|---|
| 001 | 28189 | ||
| 003 | BD-DhUET | ||
| 008 | 911023s1992 nyua b 001 0 eng | ||
| 020 | _a0306435780 | ||
| 040 |
_aDLC _cDLC _dBD-DhUET |
||
| 082 | 0 | 0 |
_a537.622 _bVAL/1992 |
| 100 | _aValiev, Kamil A. | ||
| 245 | 1 | 4 | _aPhysics of submicron lithography |
| 250 | _a1st ed. | ||
| 260 |
_aNew York _bPlenum Press _c1992 |
||
| 300 |
_axi, 493 p. _bill. _c26 cm. |
||
| 490 | _aMicrodevices | ||
| 504 | _aIncludes bibliographies | ||
| 650 | 0 | _aLithography, Electron beam | |
| 942 | _cGB | ||
| 999 |
_c28189 _d28189 |
||