| 000 | 00592nam a2200217 a 4500 | ||
|---|---|---|---|
| 001 | 29937 | ||
| 003 | BD-DhUET | ||
| 008 | 930312s1993 enka b 001 0 eng d | ||
| 020 | _a0123496705 | ||
| 040 |
_c0 _dBD-DhUET |
||
| 082 | 0 | 0 |
_a671.735 _bCHE/1993 |
| 100 | _aHitchman, Michael L. | ||
| 245 | 0 | 0 |
_aChemical vapor deposition _bprinciples and applications |
| 250 | _a1st ed. | ||
| 260 |
_aLondon _bAcademic Press _c1993 |
||
| 300 |
_av, 677 p. _bill. _c24 cm. |
||
| 504 | _aIncludes bibliographies | ||
| 650 | 0 | _aChemical vapor deposition | |
| 700 | _aJensen, Klavs F. | ||
| 942 | _cEB | ||
| 999 |
_c29937 _d29937 |
||