000 00588nam a2200205Ia 4500
001 30632
003 BD-DhUET
008 041129s2005 enka b 001 0 eng d
020 _a184265151X
040 _aERL
_cERL
_dBD-DhUET
082 _a623.8152
_bKON/2005
100 _aKonuma, Mitsuharu
245 1 0 _aPlasma techniques for film deposition
250 _a1st ed.
260 _aHarrow
_bAlpha Science International
_c2005
300 _aix, 337 p.
_bill.
_c25 cm.
504 _aIncludes bibliographies3) and index.
650 0 _aPlasma-enhanced chemical vapor deposition
942 _cGB
999 _c30632
_d30632