000 | 00588nam a2200205Ia 4500 | ||
---|---|---|---|
001 | 30632 | ||
003 | BD-DhUET | ||
008 | 041129s2005 enka b 001 0 eng d | ||
020 | _a184265151X | ||
040 |
_aERL _cERL _dBD-DhUET |
||
082 |
_a623.8152 _bKON/2005 |
||
100 | _aKonuma, Mitsuharu | ||
245 | 1 | 0 | _aPlasma techniques for film deposition |
250 | _a1st ed. | ||
260 |
_aHarrow _bAlpha Science International _c2005 |
||
300 |
_aix, 337 p. _bill. _c25 cm. |
||
504 | _aIncludes bibliographies3) and index. | ||
650 | 0 | _aPlasma-enhanced chemical vapor deposition | |
942 | _cGB | ||
999 |
_c30632 _d30632 |