Abstract:
The Early voltage describes the output conductance and the load drive capability of bipolar
transistors, so high Early voltage is desirable for any device. An increase in the collector–base
voltage causes a greater reverse bias across the collector–base junction which increases the
collector–base depletion region width, and decreasing the channel width of the base, which is
defined as “Early effect”. The Early effect has been studied extensively in conventional
bipolar junction transistors (BJTs). In the present work, closed form analytical model were
derived for Early voltage (VA) and common emitter current gain (β) for uniform, exponential
and Gaussian base doping profiles with arbitrary Germanium (Ge) profiles heterojunction
bipolar transistor (HBT). Field dependent mobility (DnSiGe), band gap narrowing (BGN) (due
to both heavy doping and presence of Germanium content in the base) and electron velocity
saturation effects (vs) were considered in this model. The effects of base doping profiles and
Germanium profiles on VA and β are observed in this work. Here it is observed that if Ge mole
fraction at emitter end (yE) is 0.01 and it increases at collector end (yC) from 0.01 to 0.3 it
increases VA exponentially. It can be found from this analysis that as yC increases due to BGN
effect, effective intrinsic carrier concentration (nieSiGe) increases towards base-collector
junction which minimizes “Early effect” and increases VA. For a particular yC and yE, VA found
highest for uniform base doping profile and lowest for Gaussian base doping profile. The
results show that VA is proportional with base doping concentration. Also keeping yC at 0.3
and if yE vary from 0.01 to 0.3 it reduces VA. It was also observed that by keeping yE at 0.01 if
yC can be increased from 0.01 to 0.3 it reduces collector current density (JCO). Effects of Ge
mole fraction on DnSiGe, nieSiGe and electric field (ElSiGe) were studied. Effect of vs was studied
on diffusivity and collector saturation current density (JCO). It is found that vs has
significant impact on both JCO and DnSiGe for uniform and exponential base doping
profiles; for Gaussian base doping profile it impact is negligible. Cutoff frequency for
HBT calculated in this work. The results obtained by using this analytical model compared
with the results available in the previous literature and found in good agreement.