Applications of plasma processes to VLSI technology
by Sugano, Takuo; Kim, Hyo-Gun.
Publisher: New York John Wiley & Sons 1978Description: xiv, 394 p. ill. 24 cm.ISBN: 0471869600.Subject(s): Semiconductors | Integrated circuitsItem type | Current location | Call number | Copy number | Status | Date due | Barcode |
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General Book | Central Library, BUET Circulation section | 623.8173/SUG/1978 (Browse shelf) | 1 | Available | 75498 |
Includes bibliographies
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