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Plasma techniques for film deposition

by Konuma, Mitsuharu.
Publisher: Harrow Alpha Science International 2005Edition: 1st ed.Description: ix, 337 p. ill. 25 cm.ISBN: 184265151X.Subject(s): Plasma-enhanced chemical vapor deposition
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Item type Current location Call number Copy number Status Date due Barcode
General Book Central Library, BUET
Reading section
623.8152 /ON/2005 (Browse shelf) 1 Available 104450
Browsing Central Library, BUET Shelves , Shelving location: Reading section Close shelf browser
623.8152/MON/1991 Monte Carlo device simulation 623.8152/NGK/1995 Complete guide to semiconductor devices 623.8152/OHR/2002 Materials science of thin films 623.8152 /ON/2005 Plasma techniques for film deposition 623.8152/PER/1993 Optical characterization of semiconductors 623.8152/PEY/1993 Introduction to semiconductor optics 623.8152/PIE/1988 Semiconductor fundamentals

Includes bibliographies3) and index.

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