Plasma techniques for film deposition
by Konuma, Mitsuharu.
Publisher: Harrow Alpha Science International 2005Edition: 1st ed.Description: ix, 337 p. ill. 25 cm.ISBN: 184265151X.Subject(s): Plasma-enhanced chemical vapor deposition| Item type | Current location | Call number | Copy number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|
| General Book | Central Library, BUET Reading section | 623.8152 /ON/2005 (Browse shelf) | 1 | Available | 104450 |
Browsing Central Library, BUET Shelves , Shelving location: Reading section Close shelf browser
| 623.8152/MON/1991 Monte Carlo device simulation | 623.8152/NGK/1995 Complete guide to semiconductor devices | 623.8152/OHR/2002 Materials science of thin films | 623.8152 /ON/2005 Plasma techniques for film deposition | 623.8152/PER/1993 Optical characterization of semiconductors | 623.8152/PEY/1993 Introduction to semiconductor optics | 623.8152/PIE/1988 Semiconductor fundamentals |
Includes bibliographies3) and index.
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